Optical emission spectroscopic (oes) instrument with automatic top and bottom slit curtains

ABSTRACT

An optical emission spectroscopic (OES) instrument includes a spectrometer, a processor and an adjustable mask controlled by the processor. The adjustable mask defines a portion of an analytical gap imaged by the spectrometer. The instrument automatically adjusts the size and position of an opening in the mask, so the spectrometer images an optimal portion of plasma formed in the analytical gap, thereby improving signal and noise characteristics of the instrument, without requiring tedious and time-consuming manual adjustment of the mask during manufacture or use.

CROSS-REFERENCE TO RELATED APPLICATION

This application is a continuation of pending U.S. patent applicationSer. No. 12/771,846, filed Apr. 30, 2010 and claims the priority benefitunder 35 U.S.C. §119(e) of U.S. Provisional Patent Application Ser. No.61/176,442 by Mark A. Hamilton, the disclosures of which areincorporated herein by reference.

TECHNICAL FIELD

The present invention relates to optical emission spectroscopic (OES)instruments and, more particularly, to such instruments thatautomatically adjust top and/or bottom curtains of an optical mask for aspectrometer, in response to analyses of optical signals analyzed by thespectrometer.

BACKGROUND ART

Analyzing chemical compositions of samples is important in manycontexts, including identifying and segregating metal types(particularly various alloys of iron and steel) in outdoor metalrecycling facilities, quality control testing in factories and forensicwork. Several analytical methods are available.

Optical emission spectroscopy (OES) is a mature, robust technology forthe elemental analysis of materials. In OES, a small quantity of samplematerial is vaporized and excited above atomic ground state. Emissionscharacteristic of elements in the vaporized sample are captured by alight guide, which sends the light to a spectrometer, which produces andanalyzes a spectrum from the light, so as to yield information about theelemental composition.

For electrically conductive samples, prevalent techniques for generatingemission spectra use either an electric arc or a spark, or both, tovaporize a small quantity of the sample to be analyzed. An electricalpotential in an analytical gap between a counterelectrode and a surfaceof the sample breaks down gas in the gap, enabling an electricalcurrent, in the form of a spark or an arc or both, to flow betweencounterelectrode and the sample surface. Typically, the spark or arcvaporizes a portion of the sample and causes the vaporized sample tomove into the analytical gap, and thereafter heats the gas in the gap,thereby exciting the vaporized sample material. In the resulting plasma,the excited sample (“analyte”) produces an optical (although possiblyinvisible) discharge that is characteristic of the elemental compositionof the excited material.

Alternatively, laser-induced breakdown spectroscopy (LIBS) or glowdischarge (GD) may be used to vaporize and excite an emission sample. Asurvey of OES analytical techniques may be found in K. Slickers,“Automatic Atomic-Emission Spectroscopy”, Second Edition (1993), whichis incorporated by reference as if fully set forth herein for allpurposes.

Regardless which excitation technique is used, an image of the excitedsample is projected onto an entrance slit of a spectrometer, whichanalyzes composition of the sample, based on wavelengths and intensitiesof the optical signal. Emissions from the analyte should be sampled froma volume of the analytical gap where the analyte is ionized. Opticalsignals from other sources, such as the heated tip of thecounterelectrode or the sample surface, could confuse the analysis andshould not, therefore, be allowed to enter the spectrometer.

A mask and/or a suitably short slit may be used to exclude theseunwanted emissions. However, masks and short slits limit the amount ofoptical signal received by the spectrometer, leading to poorsignal-to-noise ratios.

SUMMARY OF THE INVENTION

An embodiment of the present invention provides a method forautomatically adjusting a field of view of an optical emissionspectroscopic instrument. The instrument defines an analytical gap. Aspectrometer in the instrument is configured to analyze an opticalsignal produced within the analytical gap and to generate an outputsignal representative of the analysis. An adjustable mask is disposed ina light path of the instrument. The mask adjustably defines a portion ofthe analytical gap that is imaged by the spectrometer. The mask isadjusted under control of a processor.

A constituent of a sample may be identified, under control of theprocessor, based on the output signal. The mask may be adjusted, basedon the identified constituent. The constituent may be identified duringa surface preparation phase.

A plurality of time-separated output signals may be analyzed, undercontrol of the processor. The mask may be adjusted between each pair ofsuccessive output signal analyses. For example, the mask may be adjustedbetween each pair of successive output signal analyses, such that afteradjusting the mask, the spectrometer images a different, but equalsized, portion of the analytical gap, or a different sized portion ofthe analytical gap.

The mask may be adjusted until a predetermined criterion is met,relative to the output signal. For example, the mask may be adjusteduntil a predetermined noise or signal-to-noise or signal level criterionis met, relative to the output signal.

The mask may be adjusted until a predetermined signal level criterion ismet, and then the mask may be further adjusted until a predeterminedsignal-to-noise criterion is met.

The mask may include at least one curtain. Adjusting the mask mayinvolve opening or closing the at least one curtain until apredetermined noise or signal level or signal-to-noise criterion is met,relative to the output signal.

The mask may include at least two curtains. Adjusting the mask mayinvolve opening or closing one of the curtains until a firstpredetermined noise or signal level or signal-to-noise criterion is met,relative to the output signal, and then opening or closing another ofthe curtains until a second predetermined noise or signal level orsignal-to-noise criterion is met, relative to the output signal.

The mask defines an opening. Adjusting the mask may involve adjustingthe mask so as to translate the opening until a predetermined noise orsignal level or signal-to-noise criterion is met, relative to the outputsignal. At least one of the curtains may at least partially define theopening. The at least one curtain may be opened or closed until a firstpredetermined noise or signal level or signal-to-noise criterion is met,relative to the output signal.

The mask may include at least two curtains at least partially definingthe opening. Another of the curtains may be opened or closed until asecond predetermined noise or signal level or signal-to-noise criterionis met, relative to the output signal.

Another embodiment of the present invention provides a self-adjustingoptical emission spectroscopic instrument for analyzing composition of aportion of a sample. The instrument includes an exciter, a spectrometer,an adjustable mask and a processor. The exciter is capable of excitingthe portion of the sample within an analytical gap. The excitationproduces an optical signal. The spectrometer is disposed in theinstrument to receive the optical signal. The spectrometer disperses theoptical signal and produces an output signal from the dispersed opticalsignal. Then adjustable mask is also disposed in the instrument, along apath of the optical signal. The adjustable mask adjustably defines aportion of the analytical gap imaged by the spectrometer. The processoris coupled to the spectrometer and to the mask. The processor isprogrammed to process the output signal and to adjust the mask.

The processor may also be programmed to identify a constituent of asample based on the output signal, as well as to adjust the mask basedon the identified constituent. The processor may also be programmed toidentify the constituent of the sample during a surface preparationphase.

The processor may also be programmed to analyze a plurality oftime-separated output signals and to adjust the mask between each pairof successive output signal analyses. The processor may be programmed toadjust the mask between each pair of successive output signal analyses,such that the spectrometer images a different, but equal sized, portionof the analytical gap, or such that the spectrometer images a differentsized portion of the analytical gap.

The processor may be programmed to adjust the mask until a predeterminedcriterion is met, relative to the output signal. For example, theprocessor may be programmed to adjust the mask until a predeterminednoise or signal-to-noise or signal level criterion is met, relative tothe output signal.

The processor may be programmed to adjust the mask until a predeterminedsignal level criterion is met, and then to adjust the mask until apredetermined signal-to-noise criterion is met.

The mask may include at least two curtains. The processor may beprogrammed to open or close one of the curtains until a firstpredetermined noise or signal level or signal-to-noise criterion is met,relative to the output signal. The processor may be further programmedto open or close another of the curtains until a second predeterminednoise or signal level or signal-to-noise criterion is met, relative tothe output signal.

The mask may define an opening. The processor may be programmed toadjust the mask so as to translate the opening until a predeterminednoise or signal level or signal-to-noise criterion is met, relative tothe output signal. The mask may include at least one curtain at leastpartially defining the opening. The processor may be programmed to openor close the at least one curtain until a first predetermined noise orsignal level or signal-to-noise criterion is met, relative to the outputsignal.

The mask may include at least two curtains at least partially definingthe opening. The processor may be programmed to open or close another ofthe curtains until a second predetermined noise or signal level orsignal-to-noise criterion is met, relative to the output signal.

Yet another embodiment of the present invention provides a computerprogram product for use on a computer for automatically adjusting afield of view of an optical emission spectroscopic instrument. Theinstrument defines an analytical gap and including a spectrometer. Thespectrometer is configured to analyze an optical signal produced withinthe analytical gap. The spectrometer generates an output signalrepresentative of the analysis. The instrument further including anadjustable mask in a light path of the instrument. The mask adjustablydefines a portion of the analytical gap imaged by the spectrometer. Atangible computer usable medium has computer readable program codestored thereon. When the program code is executed by the computer, thecomputer adjusts the mask.

The tangible computer usable medium may have additional computerreadable program code stored thereon. When the program code is executedby the computer, the computer identifies a constituent of a sample basedon the output signal. Based on the identified constituent, the computeradjusts the mask.

Optionally or alternatively, when the program code is executed by thecomputer, the computer analyzes a plurality of time-separated outputsignals. The computer adjusts the mask between each pair of successiveoutput signal analyses.

The computer may adjust the mask until a predetermined criterion is met,relative to the output signal. For example, the computer may adjust themask until a predetermined noise or signal-to-noise or signal levelcriterion is met, relative to the output signal. The computer may adjustthe mask until a predetermined signal level criterion is met, and thenadjust the mask until a predetermined signal-to-noise criterion is met.

BRIEF DESCRIPTION OF THE DRAWINGS

The invention will be more fully understood by referring to thefollowing Detailed Description of Specific Embodiments in conjunctionwith the Drawings, of which:

FIG. 1 is a schematic diagram showing components of an optical emissionspectroscopy (OES) analyzer, according to an embodiment of the presentinvention;

FIG. 2 contains a graph representing a hypothetical emission spectrumwith a relatively low noise level;

FIG. 3 contains a graph representing a hypothetical emission spectrumwith a relatively high noise level;

FIG. 4 is a schematic diagram showing components of an OES analyzer,according to an embodiment of the present invention;

FIG. 5 is a block diagram of major components and subsystems of theself-adjusting OES instrument of FIG. 11;

FIGS. 6-10 are flowcharts depicting processes for adjusting masks,according to various embodiments of the present invention;

FIG. 11 is a perspective cut-away view of a self-adjusting OESinstrument, according to an embodiment of the present invention; and

FIG. 12 is a perspective view of a spectrometer in the self-adjustingOES instrument of FIG. 11.

DETAILED DESCRIPTION OF SPECIFIC EMBODIMENTS

In accordance with embodiments of the present invention, methods andapparatus are disclosed for automatically adjusting a field of view ofan optical emission spectroscopic (OES) instrument. The instrumentincludes a spectrometer and an adjustable mask controlled by aprocessor. As a result, the instrument may automatically adjust the sizeand position of an opening in the mask, so the spectrometer images anoptimal portion of plasma formed in an analytical gap, thereby improvingsignal or noise characteristics of the instrument, without requiringtedious and time-consuming manual adjustment of the mask duringmanufacture or use.

As shown in FIG. 1, in arc/spark OES analysis, plasma 100 is formed inan analytical gap 104 between a counterelectrode 108 and a samplesurface 110. Light 114 (typically in a range of wavelengths from about170 nm to about 450 nm, i.e. mostly in the ultraviolet spectrum) fromthe plasma 100 is analyzed by a spectrometer 118 and a processor 120 todetermine elemental composition of the sample 110. An image of theplasma 100 is typically projected onto a slit 124 of the spectrometer,such that the axis 126 of the plasma 100 is aligned with the long axisof the slit 124. A dispersive element 128 (such as a grating or a prism)produces a wavelength-dispersed optical signal (spectrum) 130, which isdistributed across a plurality of detectors 134. Each of the detectors134 is positioned to receive a different, yet narrow, range ofwavelengths of the spectrum 130. The detectors 134 produce electricalsignals 136 that are fed to the processor 120. As noted, othertechniques, such as laser-induced breakdown spectroscopy (LIBS) or glowdischarge (GD), may be used to vaporize and excite the sample 110.

Excited elements in the plasma 100 emit light at characteristicwavelengths and relative intensities. FIG. 2 contains a graphrepresenting a hypothetical emission spectrum projected onto thedetectors 134. Emissions characteristic of the sample 110 appear asrelatively tall lines, exemplified by lines 200, that indicate by theirheights the amount of light detected at respective wavelengths. Byidentifying the wavelengths and relative heights of some or all of thelines 200, etc., in the spectrum 130, the processor 120 may ascertainthe composition of the sample 110, including identifying relativeconcentrations of various elemental constituents, thus identifying analloy or other classification to which the sample 110 belongs.

Other emissions, such as from material eroded from the counterelectrode108 and from environmental gases present in the analytical gap 104, aretypically present in relatively small quantities and, in a well-adjustedanalytical instrument, contribute to a relatively low strengthbackground signal (“noise”) 204. Noise is also caused by recombinationphenomena at the sample surface 110. The ratio of the height of thelines 200, etc., to the amplitude of the noise 204 is commonly referredto as a signal-to-noise ratio (“S/N”).

In a poorly adjusted instrument, the noise level 300 may be high, asshown in FIG. 3. The noise level 300 may be high enough to overwhelmsome or all of the lines 200, etc., thus precluding analysis of thesample, or at least reducing accuracy of the analysis.

Returning to FIG. 1, the temperature of the plasma 100 varies along itslength. The portion of the plasma 100 close to the tip of thecounterelectrode 108 is typically cooler (at about 1,000° K) than theportion of the plasma 100 close to the sample surface 110 (which may beabout 10,000° K). Optimum analysis of the spectrum 130 generallyrequires a relatively high signal-to-noise ratio, which involvesallowing as much light as possible from a desired portion 138 of theplasma 100 to reach the spectrometer 118, while preventing opticalsignals from the ends of the plasma 100, the counterelectrode 108 andthe surface 110 from reaching the spectrometer 118. This is oftenaccomplished by disposing a mask along an optical path of the light 114,such that an opening in the mask admits light from the desired portion138 of the plasma 100, and the mask blocks light from the unwantedportions of the plasma 100. The mask may, for example, be disposed on ornear the slit 124 to define effective top and bottom extents of the slit124.

The location and size of the desired portion 138 of the plasma 100varies depending on several factors, including the size of theanalytical gap 104; the amount of electrical power introduced into theanalytical gap; and the base material (such as iron, aluminum, zinc ortitanium) of the sample 110. Thus, the optimum size of the mask opening,as well as the optimum locations of the top and bottom portions of themask, also vary with these factors.

In conventional OES instruments, the positions of the top and bottomportions of the mask, and therefore the size of the mask opening, arefixed, typically during manufacture of the instrument or thereafter whenthe instrument is serviced. However, such a fixed size and positionscombination represents, at best, a compromise among several competingobjectives. For example, the mask may be configured to facilitateanalyzing both iron-based and aluminum-based samples, although such amask configuration may not be optimum for either type of sample,inasmuch as a different mask configuration would yield a largersignal-to-noise ratio when analyzing an iron-based sample, and a yetdifferent mask configuration would yield a larger signal-to-noise ratiowhen analyzing an aluminum-based sample. Furthermore, determining themask configuration for a given OES instrument typically involves alabor-intensive process due, at least in part, to slight mechanical andother variations among OES instruments. Thus, fixed-size andfixed-position masks pose problems.

These and other problems associated with the prior art may be solved byautomatically adjusting the mask under control of the processor 120 inresponse to the signals 136 received from the spectrometer 118. Theseautomatic adjustments may be made as part of a manufacturing or repairprocess and/or during normal use. For example, the mask may be adjusteduntil a predetermined criterion, such as a maximum signal-to-noiseratio, is met. An embodiment of an adjustable mask 300 is shownschematically in FIG. 4. The mask 400 includes two independentlyadjustable curtains 402 and 404. The positions of the curtains 402 and404 may be adjusted, as indicated by arrows 408 and 410, to raise orlower edges 414 and 418, respectively, of the curtains 402 and 404,thereby adjusting the size and/or position of the opening 420 in themask 400. A dashed outline 422 indicates the outer extent of the light114, i.e., an image of the plasma 100, that would otherwise be processedby the spectrometer 118.

Collectively, the curtains 402 and 404 limit a field of view of thespectrometer 118, i.e., an amount and portion of the analytical gap 104that is imaged by the spectrometer 118. “Imaged by the spectrometer”means impinging on the dispersive element 128 that produces the spectrum130 that impinges on the detectors 134. Thus, the curtains 402 and 404limit the amount and portion of the plasma 100 that is (or would be)imaged by the spectrometer 118. One curtain 402 limits the amount of thecounterelectrode 108 side of the plasma 100 that can be imaged by thespectrometer 118, and the other curtain 404 limits the amount of thesample 110 side of the plasma 100 that can be imaged by the spectrometer118. For example, lowering curtain 402 cuts off progressively more ofthe plasma 100, beginning with the counterelectrode 108 end of theplasma 100.

The curtains 402 and 404 may, but need not, be capable of openingslightly wider than necessary to image the entire analytical gap 104.That is, the curtains 402 and 404 may be capable of opening wide enoughto image a portion of the counterelectrode 108 or a portion of thesample 110, respectively. This capability may be useful when, forexample, the counterelectrode 108 becomes shorter through erosion or anoperator inadvertently mis-orients the instrument so as to leave a gapbetween the instrument and the sample surface 110. (Ideally, a snout ofthe instrument is typically brought into contact with the sample surface110, leaving no gap between the instrument and the sample surface 110.)

It should be noted that the analytical gap 104 increases in size as thecounterelectrode 108 erodes. The size of the analytical gap 104 alsodepends on the location of the sample surface 110, relative to the tipof the counterelectrode 108. As used herein, the term “analytical gap”means all or any portion of a region that might reasonably be expectedto contain plasma when an instrument is in reasonable use, i.e., all orany portion of a region from approximately the tip of thecounterelectrode (allowing for reasonable variations in counterelectrodelocation due to variability of installation of the counterelectrode, andallowing for reasonably expected wear of the counterelectrode) toapproximately the sample surface (allowing for reasonable variation inpositioning of the instrument, relative to the sample). “Analytical gap”does not necessarily mean the entire region that might contain plasmawhen an instrument is in reasonable use.

The curtains 402 and 404 may, but need not, be capable of completelyclosing the opening 420. Furthermore, the maximum excursions of thecurtains 402 and 404 may overlap. That is, the maximum downwardexcursion of the top curtain 402 may place the lower edge 414 of the topcurtain 402 lower than the maximum upward excursion of the bottomcurtain 404 would place its upper edge 418. However, the curtains 402and 404 may be operated such that, in use, the curtains never actuallyoverlap each other. The curtains need not be coplanar.

The curtains 402 and 404 also may, but need not, be moved together. Forexample, both curtains 402 and 404 may be moved the same distance and inthe same direction, thereby maintaining a constant size opening 402between the edges 414 and 418 of the curtains. Such coordinated movementof the two curtains 402 and 404 essentially translates the opening 420,thereby essentially scanning the opening 402 across a portion of theanalytical gap 104.

Collectively, the curtains 402 and 404 determine the amount and portionof the analytical gap 104 that may be imaged by the spectrometer 118.Thus, the mask 400 adjustably defines a portion of the analytical gap104 that may be imaged by the spectrometer 118.

In some embodiments, the curtains 402 and 404 are operated by respectivestepper motors 424 and 428 through respective rack-and-pinion gearcouplings. Screw drives or other suitable couplings may be used. Themotors 424 and 428 may be driven by respective motor drive circuits 430and 434 under control of the processor 120. In other embodiments, thecurtains 402 and 404 are operated by any suitable mechanical, hydraulic,pneumatic, piezoelectric, electromagnetic or other actuators,microactuators or combinations thereof. In one embodiment, theanalytical gap 104 is about 3-5 mm, and the curtains 402 and 404 and theactuators are configured to move the curtains 402 and 404 in incrementsof about 0.1 mm. Other (larger or smaller) analytical gaps and curtainincrements may be used.

Optionally, position sensors, encoders or resolvers (not shown) may bedisposed to detect the positions of the curtains 402 and 404 or theactuators and to provide signals representing these positions to theprocessor 120. Thus, the curtains 424 and 428 may be controlled by theprocessor 120 in an open-loop fashion or as part of a servomechanism.The curtains 402 and 404 may be flat, as shown in FIG. 4, or thecurtains 402 and 404 may be curved or another suitable shape, based onoptical and mechanical considerations, such as fitting the curtains andactuators in an instrument without interfering with light paths.Optionally (not shown), only one of the curtains 402 or 404 may beoperated by a first actuator, and the other curtain may be fixed, withrespect to a moveable carriage to which the first actuator is attached.A second actuator may be coupled to the carriage to control itsposition.

The processor 120 may execute program code to process the signals 136from the detectors 134 and, in response, cause one or both of thecurtains 402 and 404 to move in order to meet a predetermined criterionor to facilitate analysis of the sample 110. For example, the sizeand/or position of the opening 420 in the mask 400 may be adjusted tomaximize the heights of the lines 200, etc. (FIG. 2). This may beaccomplished by enlarging the opening 402 to admit more light 114, or bytranslating the opening 402 such that a more fruitful portion of theplasma 100 is imaged by the spectrometer 118. In general, the mask 400may be adjusted to maximize the detected strengths of the emissions thatcharacterize the sample 110. Optionally or alternatively, the sizeand/or position of the mask 400 may be adjusted to minimize theamplitude of the noise 204 or 300 (FIGS. 2 and 3), to maximize thesignal-to-noise ratio, or to meet another predetermined criterion orseveral predetermined criteria or according to another algorithm orheuristic (collectively referred to herein as a “criterion”).

In general, unwanted emissions caused by the counterelectrode 108 and bythe surface 110 result in a broad “hump” of noise 300 (FIG. 3), with thenoise level being highest near the center of the wavelength rangedepicted, and the noise level being lower at longer and at shorterwavelengths, as shown. The general hump shape of the noise 300 profilemay be used by the processor 120 to distinguish noisy spectral data fromspectral data that is less noisy, as exemplified by the relatively flatnoise profile 204 in FIG. 2. The cooler region of the plasma 100 mayexhibit a more well-defined “hump” as a result of thermal recombinationthan the hotter region of the plasma 100.

In some embodiments, the processor 120 analyzes the signals 136 from thedetectors 134 and, based on results of the analysis, causes one or moreof the curtains 402 and 404 to move a specified amount in a specifieddirection. For example, if analysis of the signals 136 indicates thatthe signal strength, i.e., the heights of the lines 200, etc., (FIG. 2)is insufficient to meet the criterion, the processor 120 may cause oneor both of the curtains 402 and 404 to open by a desired step amount(such as about 0.1 mm), i.e., to increase the size of the opening 420,thereby admitting more of the light 114 to be processed by thespectrometer 118. After the curtains 402 and/or 404 achieve their newpositions, the processor 120 may analyze fresh signals 136 and againdetermine if the criterion is met. If the criterion is not met, theprocessor 120 repeats by further opening the curtains 402 and/or 404(unless the curtains 402 and 404 can not be opened further) and analyzesfresh signals 136. Thus, the mask 400, the spectrometer 118 and theprocessor 120 operate as a feedback system, as indicated by arrow 438.

The processor 120 may, but need not, directly or indirectly controloperation of a power supply 440 that provides electrical power to thecounterelectrode 108 to cause sparks and/or arcs between thecounterelectrode 108 and the sample surface 110. If the processor 120directly or indirectly (such as through another processor) controls thepower supply 440, the processor may coordinate generating sparks/arcswith the above-described analysis of the signals 136 from the detectors134. For example, the processor 120 may cause one or more sparks/arcs tobe generated each time fresh signals 136 are required, i.e., before orafter each adjustment of the positions of the curtains 402 and 404,until the criterion is met. If the polarity of the counterelectrode 108and the sample surface 110 are reverses, such as to clean thecounterelectrode 108, the hotter and cooler ends of the plasma 100exchange positions. Thus, the curtain positions may need to be adjustedcorrespondingly.

An arc/spark-based OES analysis sequence typically begins with about 200to 500 sparks to prepare the surface 110 of the sample. These sparksburn off or evaporate surface contaminants, as well as melt and re-melta portion of the surface 110 to blend the sample, thereby yielding amore representative elemental composition of the sample. After thissurface preparation phase has been completed, additional sparks/arcs aregenerated to analyze the sample, as described above.

Conventionally, no analysis of the sample is performed during thesurface preparation phase. However, in some embodiments, light 114resulting from some or all of the surface preparation sparks may beanalyzed to adjust the curtains 402 and 404. In one embodiment, some orall of the surface preparation sparks are used to determine the basematerial, such as iron, aluminum, zinc or titanium, of the sample 110.This determination need not necessarily identify other constituents orthe alloy of the sample 110. However, identifying the base material ofthe sample 110 enables the processor 120 to at least preliminarilyadjust the mask 400.

For example, because the portion of the plasma 100 close to the samplesurface 110 is hotter than the portion of the plasma 100 close to thecounterelectrode 108, the mask 400 may be adjusted to image the portionof the analytical gap 104 that is of a preferred temperature, based onthe base material of the sample 110. Iron-based materials require highertemperatures than aluminum-based materials to emit comparableintensities of light 114. Thus, if the base material is determined to beiron, the curtains 402 and 404 may be adjusted so the opening 402 imagesa hotter portion of the plasma 100. However, if the base material isdetermined to be aluminum, the curtains 402 and 404 may be adjusted sothe opening 402 images a cooler portion of the plasma 100.

Similarly, hard line emissions emanate from the hotter portion of theplasma 100. Conversely, soft line emissions emanate from the coolerportion of the plasma 100. A given sample may include both hard lineelements and soft line elements. After the surface preparation phase,while the sample 110 is being analyzed, the opening 420 may betranslated to image different temperature portions of the plasma 100,essentially sweeping through the available plasma temperatures, so as togenerate the maximum amount of light 114 from each element in the sample110, although not necessarily generating the maximum amount of light 114from all of the elements at the same time. This sweeping ability is onefactor that obviates the need for a compromise mask size and positioncombination used in the prior art.

FIG. 6 contains a flowchart depicting operations that may be performed,according to one embodiment. In general, the flowchart of FIG. 6 depictsa process for adjusting a mask until a predetermined criterion is met.At 600, an adjustable mask is disposed in a light path, such that themask adjustably defines a portion of an analytical gap imaged by aspectrometer. This operation may be performed when an OES instrument ismanufactured or retrofitted with the adjustable mask. At 602, one ormore sparks and/or arcs are generated, thereby creating plasma. At 604,light from the analytical gap is analyzed by the spectrometer. At 608,if a predetermined criterion is met, control passes to 610, whereanalysis of the sample continues. However, if the predeterminedcriterion is not met, control passes to 614, where the mask is adjustedunder control of a processor. Thereafter, control returns to 600.

As indicated at 618, the criterion may require: receipt of at least aminimum signal level; at least a minimum average signal level over aspecific range of wavelengths; at least a minimum signal level for oneor more specific wavelengths; at most a maximum noise level; at most amaximum average noise level; at most a maximum noise level at a specificwavelength or within a specific range of wavelengths; at least a minimumsignal-to-noise (S/N) ratio; or at least a minimum S/N ratio at aspecific wavelength or within a specific range of wavelengths. Thecriterion may involve adjusting the mask to: maximize signal level;minimize noise; maximize S/N; or another criterion. For example, thebottom curtain may be opened progressively wider until the noise level(presumably from surface recombination) begins to rise or the noisereaches a predetermined value or the S/N ratio reaches a predeterminedvalue. Optionally, after reaching such a point, the curtain may beclosed by a small predetermined amount or until the noise level drops.

A criterion may involve varying a mask parameter, such as the locationof the top edge of the bottom curtain, throughout a range of possiblevalues (such as the entire range of possible curtain edge positions) andanalyzing the output signals from the spectrometer after each or some ofthe possible curtain-edge locations, then setting the mask parameteraccording to which curtain position value provided the best signallevel, the best noise level, the best S/N, etc. If a range of curtainedge positions provided equally good results, the mask parameter may beset to the middle of the range. As noted, the criterion may include acombination of criteria.

As indicated at 620, the mask adjustment may include: enlarging theopening defined by the mask; reducing the size of the opening; raisingor lowering one or the other of the curtains; translating the opening;or a combination thereof. The flowchart depicts a loop. Additionalstopping criteria (not shown), such as reaching an adjustability limitof the mask or performing a predetermined maximum number of iterations,may be employed, as is well known in the art of computer programming.

FIG. 6 depicts a process for adjusting a mask until a predeterminedcriterion is met. Thereafter, full analysis of the sample may commenceat 610. In another embodiment, as depicted in a flowchart in FIG. 7, themask may be adjusted until one criterion is met, then the mask may befurther adjusted until a second criterion is met, before full analysiscommences. In particular, each curtain may be separately adjusted. Forexample, the top curtain may be progressively raised to a position wherethe admitted signal level is high, but optical signals from thecounterelectrode's influence are blocked. Then, the bottom curtain maybe progressively lowered to a position where the admitted signal levelis high, but optical signals from the surface's influence remainblocked.

At 700, an adjustable mask is disposed in a light path, such that themask adjustably defines a portion of an analytical gap imaged by aspectrometer. At 704, one or more sparks and/or arcs are generated,thereby creating plasma. At 708, light from the analytical gap isanalyzed by the spectrometer. At 710, if a first predetermined criterionis met, control passes to 714. However, if the first predeterminedcriterion is not met, control passes to 718, where the mask is adjustedunder control of a processor. Thereafter, control returns to 704.

As noted at 720, the first predetermined criterion may be similar to anyof the criteria discussed with respect to FIG. 6. As noted at 724, themask may be adjusted by raising or lowering the curtain.

At 714, one or more sparks and/or arcs are generated, thereby creatingplasma. At 728, light from the analytical gap is analyzed by thespectrometer. At 730, if a second predetermined criterion is met,control passes to 734, where full analysis of the sample may commence.However, if the second predetermined criterion is not met, controlpasses to 738, where the mask is adjusted under control of a processor.Thereafter, control returns to 714.

As noted at 740, the second predetermined criterion may be similar toany of the criteria discussed with respect to FIG. 6. As noted at 744,the mask may be adjusted by raising or lowering the other curtain. Theflowchart depicts two loops. Additional stopping criteria (not shown),such as reaching an adjustability limit of a curtain or performing apredetermined maximum number of iterations, may be employed, as is wellknown in the art of computer programming.

It is possible that each of the two adjustments, i.e., operations (704,708, 710 and 718) and operations (714, 728, 730 and 738), influences theother adjustment. Thus, if the second criterion is met at 730, a checkmay be performed at 732 to determine if the first criterion is stillmet. If not, control may return to 704. Optionally, as indicated at 748,the two adjustments may be repeated a predetermined number of times oruntil a third criterion (such as a change smaller than a predeterminedamount is made during a given iteration) is met.

In yet other embodiments, the mask may be adjusted in two phases,although both curtains may be adjusted during each phase. One suchembodiment is described with reference to a flowchart in FIG. 8. At 800,the mask is adjusted to meet a signal level criterion, such asmaximizing signal level, and then at 804, the mask is adjusted to meet aS/N criterion, such as maximizing S/N. Each operation, 800 and 804, maybe performed according to the description provided above, with respectto FIG. 6. After both criteria are met, full analysis of the sample maycommence at 808.

FIG. 9 contains a flowchart depicting operations that may be performed,according to another embodiment. In general, the flowchart of FIG. 9depicts adjusting a mask during a surface preparation phase. At 900, anadjustable mask is disposed in a light path, such that the maskadjustably defines a portion of an analytical gap imaged by aspectrometer. At 904, one or more surface preparation sparks and/or arcsare generated. At 908, light from the analytical gap is analyzed by thespectrometer and a processor, and the processor thereby identifies aconstituent (such as a base material) of a sample. At 910, the mask isadjusted by the processor, based on the identified constituent. Asindicated at 914, the mask adjustment may include: enlarging the openingdefined by the mask; reducing the size of the opening; raising orlowering one or the other of the curtains; translating the opening; or acombination thereof. For example, for iron-based samples, the maskopening may be translated toward the hotter portion of the plasma,whereas for aluminum-based samples, the mask may be translated towardthe cooler portion of the plasma.

FIG. 10 contains a flowchart depicting operations that may be performed,according to yet another embodiment. In general, the flowchart of FIG.10 depicts a process for scanning the analytical gap to image differenttemperature portions of a plasma, so as to generate the maximum amountof light from a number of different elements in the sample, where eachelement's emissions may peak at a different temperature. At 1000, anadjustable mask is disposed in a light path, such that the maskadjustably defines a portion of an analytical gap imaged by aspectrometer. At 1004, one or more sparks and/or arcs are generated,thereby creating the plasma. At 1008, light from the analytical gap isanalyzed by the spectrometer and a processor. At 1010, if the analysisset is complete, control passes to 1014, otherwise control passes to1018, where the mask is adjusted.

As indicated at 1020, the mask adjustment may include translating theopening defined by the mask; enlarging the opening; reducing the size ofthe opening; raising or lowering one or the other of the curtains; or acombination thereof. An analysis set may include a number ofspark/arc-spectral analysis operation pairs, i.e., operation 1004followed by operation 1008. For example, data from a number ofspark/arc-spectral analysis operation pairs may be averaged together orotherwise statistically processed to improve signal-to-noise. Asindicated at 1018, the mask may be adjusted, such as by translating theopening to image a different temperature portion of the plasma, aftereach spark/arc-spectral analysis operation pair.

Optionally, operations 1004 and 1008 may be repeated a number of timesbefore operation 1010. In other words, operations 1004 and 1008 may berepeated a number of times while the mask remains unchanged, then themask may be adjusted before operations 1004 and 1008 are again repeateda number of times.

The flowchart depicts a loop. Additional stopping criteria (not shown),such as reaching an adjustability limit of the mask or performing apredetermined maximum number of iterations, may be employed, as is wellknown in the art of computer programming.

The above-described adjustable mask and methods for automaticallyadjusting a field of view of an OES instrument may be used in bench-topand hand-holdable OES instruments. FIG. 11 is a cut-away viewperspective view of a self-adjusting, hand-holdable OES instrument 1100for analyzing composition of a portion of a sample, according to oneembodiment.

In operation, an electrically-conductive flat portion 1102 of theinstrument 1100 is pressed against an electrically-conductive samplesurface (not shown). An electrically insulated block 1104 defines a bore1106, in which the counterelectrode 100 is disposed. A spark from acounterelectrode 100 to the sample excites a portion of the sample,thereby producing an optical signal. The optical signal enters a port1108 and may be reflected by one or more mirrors (one of which isvisible at 1110) into a spectrometer 1114 inside the instrument 1100. Aprocessor (not visible) is coupled to a set of detectors (not visible)in the spectrometer 1114. The processor is programmed to process signalsfrom the detectors.

The processor analyzes at least a portion of a spectrum produced by thespectrometer 1114 to identify and quantify elemental composition of thesample. The processor may displays results of the analysis on atouchscreen 1118. A user initiates analysis by the instrument 1100 via atrigger switch 1120. Additional pushbuttons 1124 enable the user tofurther interact with the processor. A (typically rechargeable) battery1128 powers the instrument 1100.

Aspects of the spectrometer 1114, as well as integration of theadjustable mask into the instrument 1100, are described below.Additional information about such an instrument is available in U.S.patent application Ser. No. 12/036,039, titled “Hand-Held,Self-Contained Optical Emission Spectroscopy (OES) Analyzer,” filed Feb.22, 2008, which is incorporated by reference as if fully set forthherein for all purposes.

FIG. 12 is a perspective view of the spectrometer 1114 with its coverremoved. The block 1104 and bore 1106 of FIG. 11 are shown in phantom.An optical signal 1200 from a plasma within an analytical gap enters aport 1204 and is reflected by a first mirror (not visible, but indicatedat 1206) into a bore 1208 (shown in phantom) and exits a second port1210, thus following an optical path 1212. A second mirror 1214 (shownremoved for clarity) reflects the optical signal into a third port 1218,and then the optical signal then travels through a second bore 1220(shown in phantom) to an optical subassembly 1224.

In some cases (an example of which is shown in FIG. 12), thespectrometer 1114 is cross-dispersed, although this aspect of thespectrometer is not germane to the present invention. The opticalsubassembly 1224 is also shown removed from the spectrometer 1114 andwith its cover removed at 1228. The optical signals 1230 pass through aprism 1238. A dispersed optical signal 1240 impinges on a grating 1244,and a cross-dispersed optical signal 1248 is projected on a plurality ofdetectors 1250. In non-cross-dispersed cases, the prism 1238 may beomitted. The detectors 1250 are electrically coupled (not shown) to theprocessor (not shown).

In some cases, the first mirror 1206 is flat, and in other cases themirror 1206 is powered. Similarly, the second mirror 1214 may be flat orpowered. The mirrors 1206 and 1214 may be parabolic, toroidal or shapedaccording to another simple or compound curve. The two mirrors 1206 and1214 need not have identical shapes. The choice of number of mirrors,mirror placement, mirror shape, mirror size and other parameters may beinformed by overall optical, size, weight and other objectives of thespectrometer 1114.

In the optical subsystem 1228, the optical signal 1230 enters anadjustable mask 1254 having upper and lower curtains 1256 and 1258,respectively. The adjustable mask 1254 should be located at a focalpoint along the optical path 1208 and 1230 or close to the emissionorigin. Depending on the parameters of the mirrors 1206 and 1214, one ormore focal points may lie along the optical path 1208 and 1230. Forexample, instead of, or in addition to, a focal point where theadjustable mask 1254 is shown in FIG. 12, a focal point may lie atanother point along the optical path 1208 and 1230. Thus, the adjustablemask need not necessarily be located as shown in FIG. 12.

Furthermore, depending on the parameters of the mirrors 1206 and 1214,an image produced at one of the focal points may be larger than an imageproduced at the other focal point(s). It may be advantageous to locatethe adjustable mask 1254 at the focal point that produces the largerimage, because the amount of the image passed or blocked by anadjustable mask so located can be controlled with more precision,without requiring more precise curtain positioning. For example, if a 4mm tall image is produced at one focal point, and a 2 mm image isproduced at another focal point, 0.1 mm increments in curtainpositioning provide more precise control over the amount of the 4 mmtall image admitted by the mask than over the amount of the 2 mm tallimage admitted by the mask.

FIG. 5 is a block diagram of major components and subsystems of the testinstrument 1100 of FIG. 11. Instructions for a processor 1300, as wellas spectral feature prototypes, may be stored in a memory 1302.Analytical results from samples may also be stored in the memory 1302and may be displayed on the touchscreen 1118 and/or provided to anexternal device via a wired or wireless data port 1304. In addition, thememory 1302 may store tables of compositions of known materials (such asalloys) for comparison to compositions of test samples, and results ofthis comparison may be displayed on the screen 1118 and/or provided viathe port 1304.

The processor 1300 controls a power supply 1306 to generate sparks/arcs,as needed. The processor 1300 receives output signals from detectors1308 within the spectrometer 1114. The processor controls motor drivers1310, which drive actuators 1312 and 1314, which operate the upper andlower curtains, respectively.

Embodiments of the present invention provide advantages over the priorart. For example, use of an adjustable mask facilitates conservingelectrical power. Power conservation is important in hand-holdable,battery-powered analytical instruments. Light output from the plasma istypically related to power input into the analytical gap. However, asnoted, in conventional OES instruments, fixed masks are typicallyconfigured according to a compromise between several competing objects(such as being able to analyze iron-based materials and aluminum-basedmaterials), and the masks are not optimized for either objective.Consequently, to generate sufficient light for a spectrometer toanalyze, a conventional instrument must use more power than would benecessary if the mask were optimized. The present invention enables themask to be optimized. Thus, for each base material, the mask may beadjusted, and a minimum amount of electrical power may be used, therebyextending battery life.

Designing and manufacturing hand-holdable OES instruments presentgreater challenges than those faced in relation to bench-top OESinstruments. For example, counterelectrode-to-sample gaps are typicallysmaller (about 2 mm) in hand-holdable instruments than in bench-topinstruments (about 3-5 mm). Thus, mask opening size and position aremore critical in hand-holdable instruments. For example, a placementerror of, say, 0.3 mm is about twice as significant in a hand-holdableinstrument than the same error is in a bench-top instrument. The abilityof a hand-holdable instrument equipped with an adjustable mask to imagean automatically selected portion of an analytical gap enables theinstrument to dynamically select an optimum mask opening size andposition, thereby streamlining manufacturing and service of theinstrument, because critical adjustments to the mask need not be mademanually.

In addition, hand-holdable instruments are typically used in the fieldwhere samples are typically not prepared as well as for bench-topanalysis and where they are sometimes not prepared at all. Field samplestypically have more surface irregularities than polished bench-topsamples. The flexibility to image a dynamically-selected portion of ananalytical gap enables a hand-holdable instrument to compensate forvariabilities in field samples.

Furthermore, counterelectrode-to-sample distances are likely to varymore when hand-holdable instruments are used than for bench-topinstruments. The flexibility to image a dynamically-selected portion ofan analytical gap enables hand-holdable instruments to accommodate thesevariations, as well as other variations that are likely to occur withboth hand-holdable and bench-top instruments, such as: shortening ofcounterelectrodes over time due to wear; instrument-to-samplemisalignment by operators; instrument aging; thermal expansion andcontraction of input optics; and lack of rigid mechanical couplingbetween input optics and spectrometer.

A self-adjusting OES instrument has been described as including aprocessor controlled by instructions stored in a memory. The memory maybe random access memory (RAM), read-only memory (ROM), flash memory orany other memory, or combination thereof, suitable for storing controlsoftware or other instructions and data. Some of the functions performedby the instrument have been described with reference to flowchartsand/or block diagrams. Those skilled in the art should readilyappreciate that functions, operations, decisions, etc. of all or aportion of each block, or a combination of blocks, of the flowcharts orblock diagrams may be implemented as computer program instructions,software, hardware, firmware or combinations thereof. Those skilled inthe art should also readily appreciate that instructions or programsdefining the functions of the present invention may be delivered to aprocessor in many forms, including, but not limited to, informationpermanently stored on non-writable storage media (e.g. read-only memorydevices within a computer, such as ROM, or devices readable by acomputer I/O attachment, such as CD-ROM or DVD disks), informationalterably stored on writable storage media (e.g. floppy disks, removableflash memory and hard drives) or information conveyed to a computerthrough communication media, including wired or wireless computernetworks. In addition, while the invention may be embodied in software,the functions necessary to implement the invention may alternatively beembodied in part or in whole using firmware and/or hardware components,such as combinatorial logic, Application Specific Integrated Circuits(ASICs), Field-Programmable Gate Arrays (FPGAs) or other hardware orsome combination of hardware, software and/or firmware components.

These embodiments are discussed in the context of analytical techniquesand test instruments that employ OES; however, the teachings of thisapplication are applicable to other types of analytical test instrumentsand techniques that employ spectral analysis, including test instrumentsthat employ optical absorption spectroscopy. Furthermore, although thedisclosed embodiments are discussed in the context of arc/sparkexcitation, other forms of excitation, including laser-induced breakdown(LIB) and glow discharge (GD) may be used. In addition, the adjustablemask for a spectrometer and the methods described above may be used inother contexts, such as terrestrial or extraterrestrial astronomy,including in combination with or within telescopes and satellites.

While the invention is described through the above-described exemplaryembodiments, it will be understood by those of ordinary skill in the artthat modifications to, and variations of, the illustrated embodimentsmay be made without departing from the inventive concepts disclosedherein. For example, although some aspects of a self-adjusting OESinstrument and methods for automatically adjusting a field of view of anOES instrument have been described with reference to flowcharts, thoseskilled in the art should readily appreciate that functions, operations,decisions, etc. of all or a portion of each block, or a combination ofblocks, of the flowcharts may be combined, separated into separateoperations or performed in other orders. Furthermore, disclosed aspects,or portions of these aspects, may be combined in ways not listed above.Accordingly, the invention should not be viewed as limited by thespecific embodiments described herein.

What is claimed is:
 1. A method for automatically adjusting a field ofview of an optical emission spectroscopic instrument, the instrumentdefining an analytical gap extending in a direction away from a samplesurface and including a spectrometer configured to analyze an opticalsignal produced within the analytical gap and to generate an outputsignal representative of the analysis, the method comprising: disposingan adjustable mask in a light path of the instrument, such that the maskadjustably defines a portion along the analytical gap imaged by thespectrometer, wherein the mask comprises at least one curved curtain;and under control of a processor, adjusting the mask.
 2. A methodaccording to claim 1 additionally comprising exciting a portion of thesample with a laser, the excitation producing an optical signal;
 3. Amethod according to claim 1, further comprising: under control of theprocessor, identifying a constituent of a sample based on the outputsignal; wherein adjusting the mask comprises adjusting the mask based onthe identified constituent.
 4. A method according to claim 3, whereinidentifying the constituent is performed during a surface preparationphase.
 5. A method according to claim 1, further comprising: undercontrol of the processor, analyzing a plurality of time-separated outputsignals; wherein adjusting the mask comprises adjusting the mask betweeneach pair of successive output signal analyses.
 6. A self-adjustingoptical emission spectroscopic instrument for analyzing composition of aportion of a sample, the instrument comprising: a laser for exciting,within an analytical gap which extends in a direction away from a samplesurface, the portion of the sample, the excitation producing an opticalsignal; a spectrometer disposed in the instrument to receive the opticalsignal and operative to disperse the optical signal and produce anoutput signal from the dispersed optical signal; an adjustable maskdisposed in the instrument, along a path of the optical signal, suchthat the mask adjustably defines a portion along the analytical gapimaged by the spectrometer, the mask comprising at least one curvedcurtain; and a processor coupled to the spectrometer and to the mask andprogrammed to process the output signal and to adjust the mask.
 7. Aninstrument in accordance with claim 6, wherein the processor isprogrammed to: identify a constituent of a sample based on the outputsignal; and adjust the mask based on the identified constituent.
 8. Aninstrument in accordance with claim 7, wherein the processor isprogrammed to identify the constituent of the sample during a surfacepreparation phase.